Author Archives: Roei Yiftah

How to Ensure Your CMP Roughness Pad Is Optimal and Extend Its Lifetime

In the semiconductor and optics world there is a very important process known as CMP – Chemical Mechanical Planarization. One of the key players in this process is the roughness pad (A.K.A polishing pad) which is used in the following way:

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The Best Way to Keep Your Laser Focused on its Work Piece

Take laser marking, for example.

If your laser isn’t properly focused on the work piece, the marking will be the wrong shade or even completely ineffective.

However, keeping your laser in the correct focus is easier said than done.  For instance, if the work piece isn’t totally flat the laser must be programmed to a different z-distance all along the work piece.

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